Apparatus for removing impurities from effluent waste gas streams
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United States of America Patent
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Oct 29, 2002
Grant Date -
Sep 13, 2001
app pub date -
May 16, 2001
filing date -
Nov 15, 1997
priority date (Note) -
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Abstract
An apparatus for removing fluorinated and chlorinated compounds contained in waste gas streams from semiconductor etch and deposition processes. The apparatus has a treatment chamber in which a plurality of liquid films are formed to absorb the fluorinated and chlorinated compounds contained in the waste gas streams that pass through the liquid films. The apparatus includes a tank for receiving the mixture of the absorbed fluorinated and chlorinated compounds and the liquid, and a dehumidifying device for stabilizing and dehumidifying the humidified waste gas streams.
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