Projection exposure apparatus and device manufacturing method including an aperture member having a circular light transmitting portion and a light blocking member
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United States of America Patent
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Oct 29, 2002
Issued Date -
N/A
app pub date -
Jan 25, 2001
filing date -
Feb 22, 1991
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A projection exposure apparatus includes a light source for emitting light, a condensing optical system for receiving the light from the light source, for condensing the received light and for impinging the condensed light on a mask having a circuit pattern, a projection lens system for projecting the light passed through the mask onto a surface of a wafer, and an aperture member provided between the light source and the condensing optical system. The aperture member has a circular light transmitting portion for transmitting the light from the light source and a light blocking member extending across the circular light transmitting portion.
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