Method for improved low pressure inductively coupled high density plasma reactor
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United States of America Patent
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Nov 5, 2002
Issued Date -
N/A
app pub date -
Aug 9, 2000
filing date -
Feb 26, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A plasma reactor comprises an electromagnetic energy source coupled to a radiator through first and second variable impedance networks. The plasma reactor includes a chamber having a dielectric window that is proximate to the radiator. A shield is positioned between the radiator and the dielectric window. The shield substantially covers a surface of the radiator near the dielectric window. A portion of the radiator that is not covered by the shield is proximate to a conductive wall of the chamber. Plasma reactor operation includes the following steps. A plasma is ignited in a chamber with substantially capacitive electric energy coupled from the radiator. A variable impedance network is tuned so that the capacitive electric energy coupled into the chamber is diminished. The plasma is then powered with substantially magnetic energy.
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