Surface state monitoring method and apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6476393
SERIAL NO

09321505

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A surface state monitoring method and apparatus for performing in-situ monitoring of surface states of semiconductor substrates. The apparatus comprises condensing means 30 for condensing infrared radiation to an outer peripheral part of the substrate-to-be-monitored; control means 80 for controlling an incident angle of the infrared radiation condensed by the condensing means 30; condensing means 40 for condensing the infrared radiation which has undergone multiple reflection in the substrate-to-be-monitored; detecting means 50 for detecting the infrared radiation condensed by the infrared radiation condensing means 40, and analyzing means 60 for analyzing the detected infrared radiation detected and measuring contaminants staying on the surfaces of the substrate-to-be-monitored.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
ADVANTEST CORPORATIONTOKYO1279
MIYAMOTO, NOBUOTOKYO, JP0

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Michiaki Tokyo, JP 18 139
Maeda, Yasuhiro Tokyo, JP 40 279
Miyamoto, Nobuo 26-15, Sakuragaoka 7-chome, Aoba-ku, Sendai-shi, Miyagi-ken, 981-0961, JP 11 67
Niwano, Michio 18-12, Sumiyoshidai Higashi 3-chome, Izumi-ku, Sendai-shi, Miyagi-ken, 981-3222, JP 3 19
Yoshida, Haruo Tokyo, JP 73 701

Cited Art Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (2)
* 5381234 Method and apparatus for real-time film surface detection for large area wafers 19 1993
* 5386121 In situ, non-destructive CVD surface monitor 11 1993
 
MEMC ELECTRONIC MATERIALS, INC. (1)
* 5550374 Methods and apparatus for determining interstitial oxygen content of relatively large diameter silicon crystals by infrared spectroscopy 2 1994
 
Lockheed Martin Energy Systems, Inc. (1)
* 5895918 Apparatus for and method of performing spectroscopic analysis on an article 5 1998
 
Ramspec Corporation (1)
* 6310348 Spectroscopic accessory for examining films and coatings on solid surfaces 7 1999
 
SHIN-ETSU HANDOTAI CO., LTD. (1)
* 5321264 Method for evaluating surface state of silicon wafer 9 1992
 
KLA-TENCOR CORPORATION (1)
* 5910842 Focused beam spectroscopic ellipsometry method and system 120 1996
 
RESEARCH DEVELOPMENT CORP., 50% ASSIGNED (1)
* 5534698 Solid state surface evaluation methods and devices 12 1994
* Cited By Examiner

Patent Citation Ranking

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* 2005/0113,017 Air cleaning system for semiconductor manufacturing equipment 0 2004
 
MITSUBISHI DENKI KABUSHIKI KAISHA (1)
* 2006/0278,831 Infrared inspection apparatus, infrared inspecting method and manufacturing method of semiconductor wafer 7 2006
 
UNIVERSITY OF NORTH TEXAS (1)
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ADVANTEST CORPORATION (4)
* 6657196 Method and apparatus for environmental monitoring 16 2001
* 7265369 Method and system for detecting chemical substance 6 2002
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* 2004/0197,234 Chemical substance detecting method and device 3 2004
 
RAYTEX CORPORATION (1)
7616300 Edge flaw detection device 0 2005
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