Vacuum operation apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 12, 2002
Grant Date -
N/A
app pub date -
Aug 17, 2000
filing date -
Aug 20, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A vacuum operation apparatus includes a chamber, exhaust device, exhaust pipe, pressure control orifice, residence time control variable orifice, and control section. The chamber is set to a predetermined vacuum pressure in order to operate a wafer. The exhaust device evacuates the chamber. The exhaust pipe connects the exhaust device and chamber. The pressure control orifice is disposed in the exhaust pipe to control the pressure in the chamber. The residence time control variable orifice is disposed in the exhaust pipe so as to open/close independently of the pressure control orifice, and controls the residence time of gas in the chamber. The control section has a memory storing in advance an operating condition corresponding to an operation executed in the chamber, and controls driving of the exhaust device and the opening degree of the pressure control orifice.
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