Apparatus and method for phase shift photomasking
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 12, 2002
Grant Date -
N/A
app pub date -
Mar 16, 2000
filing date -
Oct 22, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A photolithographic method and apparatus are disclosed. The apparatus uses a diffraction plate or traditional optical elements to control and shape the light from an illuminator into a Gaussian light intensity distribution for illuminating a phase shift photomask. The Gaussian distribution reduces asymmetrical aberrations of the objective lens that are exaggerated by the phase shift photomask.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully