Low temperature plasma enhanced CVD ceramic coating process for metal, alloy and ceramic materials
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United States of America Patent
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Nov 19, 2002
Issued Date -
N/A
app pub date -
Dec 16, 1999
filing date -
Oct 6, 1997
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Abstract
A low temperature, high growth rate plasma enhanced chemical vapor deposition process is demonstrated for ceramic coatings on metal, alloy and ceramic substrates. The deposition process is carried out at low temperatures (<350-degC.) to prevent the bulk substrate properties from being adversely affected. The substrates are treated with gas surface hardening processes before deposition. Bonding strength (adhesion) between the coating and the substrate is improved by combining surface heat treating processes with the coating processes. Hard ceramic-solid lubricant composite coatings are used for fuel injector components, hydraulic valve components, and other wear parts. Metal-releasing agents are used to improve deposition efficiency. Electron cyclotron resonance mechanism and electromagnetic radiation are used to improve bonding strength, growth rate, coating uniformity, film smoothness and other film qualities.
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