US Patent No: 6,482,750

Number of patents in Portfolio can not be more than 2000

Method of manufacturing semiconductor device including a cleaning step, and semiconductor device manufactured thereby

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ALSO PUBLISHED AS: 20020001962
ATTORNEY / AGENT: (SPONSORED)
 

Importance

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Abstract

In a process of cleaning a semiconductor substrate on which a polysilicon film serving as a silicon-based member and a tungsten film serving as a tungsten-based member are exposed simultaneously, there is used a cleaning fluid containing a hydroxide, a water-soluble organic solvent, a compound expressed by the following chemical formula (I) or (II) which is to serve as a silicon corrosion inhibitor, an organic compound, and at least one organic compound which is to serve as a tungsten corrosion inhibitor. HO-{(EO)x-(PO)y}z-H (I) R-[{(EO)x-(PO)y}z-H]m (II)

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
MITSUBISHI DENKI KABUSHIKI KAISHATOKYO19933

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yokoi, Naoki Tokyo, JP 33 76

Cited Art

Patent Info (Count) # Cites Year
 
MITSUBISHI GAS CHEMICAL COMPANY, INC. (2)
5,911,836 Method of producing semiconductor device and rinse for cleaning semiconductor device 15 1997
5,972,862 Cleaning liquid for semiconductor devices 106 1997
 
TOKYO OHKA KOGYO CO., LTD. (2)
5,795,702 Photoresist stripping liquid compositions and a method of stripping photoresists using the same 62 1996
6,225,030 Post-ashing treating method for substrates 7 1999
 
AVANTOR PERFORMANCE MATERIALS, INC. (1)
5,989,353 Cleaning wafer substrates of metal contamination while maintaining wafer smoothness 47 1996
 
CHURCH & DWIGHT CO., INC. (1)
6,140,291 General purpose aqueous cleaner 5 1998
 
FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (1)
5,798,323 Non-corrosive stripping and cleaning composition 41 1997
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
5,091,103 Photoresist stripper 60 1990
 
OLIN MICROELECTRONIC CHEMICALS, INC. (1)
5,817,610 Non-corrosive cleaning composition for removing plasma etching residues 11 1996

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
FREESCALE SEMICONDUCTOR, INC. (1)
7,205,235 Method for reducing corrosion of metal surfaces during semiconductor processing 0 2003
 
MICRON TECHNOLOGY, INC. (1)
8,124,320 Method and apparatus for surface tension control in advanced photolithography 1 2005
 
SANDISK 3D LLC (1)
7,300,876 Method for cleaning slurry particles from a surface polished by chemical mechanical polishing 0 2004
 
TOKYO OHKA KOGYO CO., LTD. (1)
8,192,923 Photoresist stripping solution and a method of stripping photoresists using the same 0 2007

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