Electronically controlled universal phase-shifting mask for stepper exposure system
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United States of America Patent
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Nov 26, 2002
Issued Date -
N/A
app pub date -
May 7, 2001
filing date -
Oct 19, 1998
priority date (Note) -
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Abstract
A dynamic mask exposure system includes a support, a source of a beam, and a transmissive dynamic phase-shifting mask with orthogonally arranged matrices of actuator lines and binary pixel units which are opaque or transparent as a function of control inputs to the actuator lines. A control system is connected to supply pixel control signals to the actuator lines of the mask to form a pattern of transparent regions and opaque regions. The beam is directed onto the mask. A pattern detection element is located on the support. The beam passes through the transparent regions and projects a pattern from the mask onto the support or onto the image detection element. Where the image detection element is the target, there are means for providing signals representing the pattern to the control system.
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