Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element
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United States of America Patent
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Dec 10, 2002
Grant Date -
Jul 12, 2001
app pub date -
Sep 9, 1998
filing date -
Sep 11, 1997
priority date (Note) -
Expired
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Abstract
An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70.degree.. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.
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