US Patent No: 6,496,245

Number of patents in Portfolio can not be more than 2000

Developing method and developing apparatus

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO4998

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kosugi, Hitoshi Kumamoto, JP 13 57
Kyouda, Hideharu Kumamoto, JP 34 152

Cited Art Landscape

Patent Info (Count) # Cites Year
 
TOKYO ELECTRON LIMITED (4)
* 6,033,475 Resist processing apparatus 36 1995
* 6,306,455 Substrate processing method 32 1998
* 6,051,349 Apparatus for coating resist and developing the coated resist 36 1999
* 6,319,317 Coating film forming method and coating apparatus 33 2000
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
POLARIS INNOVATIONS LIMITED (1)
* 7,064,809 Apparatus and method for processing wafers 3 2005
 
APPLIED MATERIALS, INC. (9)
7,651,306 Cartesian robot cluster tool architecture 20 2005
7,925,377 Cluster tool architecture for processing a substrate 18 2006
7,694,647 Cluster tool architecture for processing a substrate 15 2006
7,819,079 Cartesian cluster tool configuration for lithography type processes 12 2006
7,798,764 Substrate processing sequence in a cartesian robot cluster tool 8 2006
7,743,728 Cluster tool architecture for processing a substrate 15 2008
8,066,466 Substrate processing sequence in a Cartesian robot cluster tool 4 2010
8,911,193 Substrate processing sequence in a cartesian robot cluster tool 0 2011
8,550,031 Cluster tool architecture for processing a substrate 1 2012
 
FUJITSU LIMITED (1)
* 2003/0173,027 Deposit removing apparatus and deposit removing method 1 2003
 
S.E.S. Company Limited (1)
* 6,792,959 Single wafer type cleaning method and apparatus 1 2003
 
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (2)
7,357,842 Cluster tool architecture for processing a substrate 28 2005
7,699,021 Cluster tool substrate throughput optimization 14 2006
 
TOKYO ELECTRON LIMITED (4)
* 2002/0053,321 Coating film forming apparatus and coating film forming method 1 2001
7,615,117 Coating and processing apparatus and method 0 2004
* 2004/0180,141 Coating and processing apparatus and method 8 2004
8,277,884 Coating and processing apparatus and method 0 2009
* Cited By Examiner