US Patent No: 6,496,245

Number of patents in Portfolio can not be more than 2000

Developing method and developing apparatus

ALSO PUBLISHED AS: 20020008857
1 Status Updates

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.

Loading the Abstract Image... loading....

First Claim

See full text

all claims..

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO4817

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kosugi, Hitoshi Beaverton, OR 24 49
Kyouda, Hideharu Kikuchi-gun, JP 54 118

Cited Art Landscape

Patent Info (Count) # Cites Year
 
TOKYO ELECTRON LIMITED (4)
* 6,033,475 Resist processing apparatus 33 1995
* 6,306,455 Substrate processing method 30 1998
* 6,051,349 Apparatus for coating resist and developing the coated resist 36 1999
* 6,319,317 Coating film forming method and coating apparatus 32 2000
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
APPLIED MATERIALS, INC. (9)
7,651,306 Cartesian robot cluster tool architecture 13 2005
7,925,377 Cluster tool architecture for processing a substrate 9 2006
7,694,647 Cluster tool architecture for processing a substrate 13 2006
7,819,079 Cartesian cluster tool configuration for lithography type processes 6 2006
7,798,764 Substrate processing sequence in a cartesian robot cluster tool 5 2006
7,743,728 Cluster tool architecture for processing a substrate 11 2008
8,066,466 Substrate processing sequence in a Cartesian robot cluster tool 2 2010
8,911,193 Substrate processing sequence in a cartesian robot cluster tool 0 2011
8,550,031 Cluster tool architecture for processing a substrate 1 2012
 
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (2)
7,357,842 Cluster tool architecture for processing a substrate 26 2005
7,699,021 Cluster tool substrate throughput optimization 10 2006
 
TOKYO ELECTRON LIMITED (2)
7,615,117 Coating and processing apparatus and method 0 2004
8,277,884 Coating and processing apparatus and method 0 2009
 
QIMONDA AG (1)
* 7,064,809 Apparatus and method for processing wafers 3 2005
 
S.E.S. CO., LTD. (1)
* 6,792,959 Single wafer type cleaning method and apparatus 1 2003
* Cited By Examiner