Developing method and developing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6496245
APP PUB NO 20020008857A1
SERIAL NO

09839293

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5258

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kosugi, Hitoshi Kumamoto, JP 13 59
Kyouda, Hideharu Kumamoto, JP 35 170

Cited Art Landscape

Patent Info (Count) # Cites Year
 
TOKYO ELECTRON LIMITED (4)
* 6033475 Resist processing apparatus 41 1995
* 6306455 Substrate processing method 32 1998
* 6051349 Apparatus for coating resist and developing the coated resist 36 1999
* 6319317 Coating film forming method and coating apparatus 36 2000
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
POLARIS INNOVATIONS LIMITED (1)
* 7064809 Apparatus and method for processing wafers 3 2005
 
APPLIED MATERIALS, INC. (9)
7651306 Cartesian robot cluster tool architecture 24 2005
7925377 Cluster tool architecture for processing a substrate 21 2006
7694647 Cluster tool architecture for processing a substrate 17 2006
7819079 Cartesian cluster tool configuration for lithography type processes 15 2006
7798764 Substrate processing sequence in a cartesian robot cluster tool 12 2006
7743728 Cluster tool architecture for processing a substrate 19 2008
8066466 Substrate processing sequence in a Cartesian robot cluster tool 6 2010
8911193 Substrate processing sequence in a cartesian robot cluster tool 1 2011
8550031 Cluster tool architecture for processing a substrate 1 2012
 
FUJITSU LIMITED (1)
* 2003/0173,027 Deposit removing apparatus and deposit removing method 1 2003
 
S.E.S. CO., LTD. (1)
* 6792959 Single wafer type cleaning method and apparatus 1 2003
 
SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. (2)
7357842 Cluster tool architecture for processing a substrate 32 2005
7699021 Cluster tool substrate throughput optimization 16 2006
 
TOKYO ELECTRON LIMITED (4)
* 2002/0053,321 Coating film forming apparatus and coating film forming method 1 2001
7615117 Coating and processing apparatus and method 0 2004
* 2004/0180,141 Coating and processing apparatus and method 9 2004
8277884 Coating and processing apparatus and method 0 2009
* Cited By Examiner