US Patent No: 6,496,245
Number of patents in Portfolio can not be more than 2000
Developing method and developing apparatus
Stats
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Dec 17, 2002
Issued date -
Apr 23, 2001
filing date -
09/839,293
serial no -
In Force
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Abstract
The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.
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First Claim
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International Classification(s)
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- [Patents Count]
Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
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| 6,033,475 Resist processing apparatus | 30 | 1995 | |
| 6,306,455 Substrate processing method | 27 | 1998 | |
| 6,051,349 Apparatus for coating resist and developing the coated resist | 33 | 1999 | |
| 6,319,317 Coating film forming method and coating apparatus | 24 | 2000 | |
Patent Citation Ranking
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