Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition

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Jan 7, 2003
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Dec 22, 1999
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Dec 22, 1999

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Abstract

A method and apparatus for performing atomic layer deposition in which a surface of a substrate is pretreated to make the surface of the substrate reactive for performing atomic layer deposition.

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EUGENUS INC	677 RIVER OAKS PARKWAY SAN JOSE CA 95134

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C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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Inventor Name	Address	# of filed Patents	Total Citations
Galewski, Carl	Aromas, CA	20	1217
Seidel, Thomas E	Sunnyvale, CA	35	4640
Sneh, Ofer	Mountain View, CA	49	7278

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Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09470279

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SERIAL NO	09470279
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09470279

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