Process for depositing at least one thin layer based on silicon nitride or oxynitride on a transparent substrate
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United States of America Patent
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Jan 7, 2003
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N/A
app pub date -
May 4, 2000
filing date -
Feb 10, 1997
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Abstract
The invention relates to a coated glass substrate, covered with at least one thin layer based on silicon nitride or silicon oxynitride. The thin layer contains the elements Si, O, N, C in the following atomic percentages:
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