Lens system for maskless photolithography
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United States of America Patent
Stats
-
Jan 21, 2003
Grant Date -
Feb 21, 2002
app pub date -
May 16, 2001
filing date -
May 25, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A system for performing digital lithography onto a subject is provided. The system utilizes pixel panels to generate pixel patterns. Mirrors are utilized to divert and align the pixel elements forming the patterns onto a subject. A gradient lens system positioned between the panels and the subject simultaneously directs the pixel elements to the subject. The pixel elements may overlapping, adjacent, or spaced as desired. The pixel elements may be directed to multiple surfaces simultaneously. One or more point array units may be utilized in the system to achieve higher resolution.
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