Method of fabricating a matrix display system
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United States of America Patent
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-
Jan 28, 2003
Issued Date -
N/A
app pub date -
Apr 27, 1998
filing date -
Feb 20, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of fabricating a display system includes bonding a silicon substrate to a second substrate with an insulating layer. The silicon substrate is thinned to form a thin film silicon-on-insulator (SOI) structure. A matrix display circuit is formed with the SOI structure. A light shield pattern is formed over regions of the matrix display circuit. A light source, the matrix display circuit and a magnifying lens are positioned within a display housing such that light from the light source is directed onto the display and an image on the display is magnified by the lens for viewing by a user.
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