Substrate processing apparatus
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United States of America Patent
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-
Jan 28, 2003
Grant Date -
Jul 25, 2002
app pub date -
Jan 16, 2002
filing date -
Jan 19, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In a substrate processing apparatus, processing units are stacked in a multistage manner around a transport robot arranged at the center of a processing area for forming a processing part. In a second hierarchy, rotary coating units are arranged through an indexer and a transport robot. In a fourth hierarchy located above the second hierarchy, rotary developing units are stacked above the rotary coating units respectively. Multistage thermal processing units and an edge exposure unit are horizontally arranged above an interface mechanism part. Thus, a substrate processing apparatus capable of reducing the area for setting the same is provided.
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