Dibasic ester stripping composition
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United States of America Patent
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Jan 28, 2003
Issued Date -
N/A
app pub date -
Sep 14, 2000
filing date -
Jan 30, 1996
priority date (Note) -
Expired
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Abstract
A mixture of a dibasic ester (DBE), an alcohol, a polar solvent and water to remove photoresist from a flat panel substrate. Photoresist is effectively removed at low temperature with this non-phenolic, non-halogenated stripper solution.
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