Optical measurement system using polarized light
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United States of America Patent
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-
Feb 4, 2003
Grant Date -
May 9, 2002
app pub date -
Oct 19, 2001
filing date -
Sep 22, 1997
priority date (Note) -
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status (Latency Note)
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Abstract
An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes a light source for generating a light beam, a static polarizing element for polarizing the light beam emanating from the light source, and a measurement system for measuring the light reflected from the substrate location. The measurement system includes a static beam splitting element for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.
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