Process for depositing layers based on metal oxide(s)
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United States of America Patent
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Feb 11, 2003
Grant Date -
N/A
app pub date -
Mar 12, 1999
filing date -
Mar 13, 1998
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Abstract
The invention is about a process for depositing via the sol-gel route a continuous or discontinuous layer based on metal oxide(s) on a substrate (1), especially a transparent substrate, which includes at least the following steps: (a)--preparation of a sol from at least one metal precursor, at least one chelating/stabilizing agent, optionally at least one solvent and/or at least one dopant precursor, (b)--deposition of the sol as a layer on at least part of one of the faces of the substrate (1), (c)--irradiation by ultraviolet rays of at least part of the sol deposited as a layer on the substrate (1), (d)--heat treatment of at least that part of the sol which was irradiated by the ultraviolet rays.
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