Particle manipulation
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United States of America Patent
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Feb 11, 2003
Grant Date -
N/A
app pub date -
Nov 29, 1999
filing date -
Apr 2, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a substrate surface. A device for manipulating of particles in plasma-cristalline state includes a reaction vessel, in which plasma electrodes and at least one substrate are situated. An adaptive electrode for formation of a location selective low frequency or static electrical field in the reaction vessel is described.
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