Nonvolatile semiconductor memory
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United States of America Patent
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Feb 18, 2003
Grant Date -
Jan 10, 2002
app pub date -
May 21, 2001
filing date -
May 22, 2000
priority date (Note) -
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Abstract
A drain-side select gate line is set to VSG1 (>VDD) capable of sufficiently transferring VDD (time t1). Since all word lines in the selected block are set to Vread, VDD is applied to the channels of all memory cells in the cell units. After this, the drain-side select gate line is set to VSG2, and a program potential Vpgm is applied to the selected word line (times t2 to t3). Since VSG2 is sufficiently low, all drain-side select gate transistors are kept off, and the channel potentials of memory cells in all cell units are boosted. After this, since the drain-side select gate line is set to VSG3, the channel of the selected memory cell is set to 0V (time t4).
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