Substrate processing system and substrate processing method

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United States of America Patent

PATENT NO 6526329
APP PUB NO 20010048865A1
SERIAL NO

09866717

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Abstract

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The present invention is a substrate processing method comprising the steps of successively extracting unprocessed wafers from a cassette, successively conveying the extracted wafers to a plurality of processing units, causing the processing units to process the wafers in parallel, and returning the processed wafers to a cassette. A process completion prediction time at which processes for one lot are completed is calculated and displayed corresponding to a process recipe that has been set to a plurality of wafers for at least one lot. Corresponding to the process completion prediction time, a cassette that contains a plurality of unprocessed wafers for one lot is accepted. A cassette that contains a plurality of processed wafers for one lot is returned.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED107-6325 MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujimaru, Syuzo Kikuchi-Gun, JP 3 49
Tateyama, Masanori Kikuchi-Gun, JP 14 594

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