Removing flux residue from reflow furnace using active gaseous solvent
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Mar 4, 2003
Grant Date -
N/A
app pub date -
May 31, 2000
filing date -
May 31, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of cleaning residue on surfaces in a reflow furnace includes introducing a solvent into the furnace chamber; reacting the solvent with the residue to form a product; and, removing the product from the furnace chamber. The solvent is gaseous, such as an etch gas. Also, the product of the reaction between the residue and the solvent can is gaseous. The gaseous product can then be exhausted from the reflow furnace. A reflow furnace for practicing the method is also disclosed.
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