Method of forming a film in a chamber and positioning a substitute in a chamber
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United States of America Patent
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Mar 11, 2003
Grant Date -
N/A
app pub date -
Jul 9, 1999
filing date -
Jul 9, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Methods and apparatuses of forming a film on a substrate including introducing a pretreatment material into a processing chamber sufficient to form a film as a portion of an inner surface of the processing chamber to inhibit outgassing from that portion of the chamber, introducing a substrate into the chamber, and forming a film on the substrate.
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