Integrated circuit manufacture
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United States of America Patent
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Mar 11, 2003
Grant Date -
N/A
app pub date -
Jul 14, 2000
filing date -
Jul 16, 1999
priority date (Note) -
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status (Latency Note)
Importance
Abstract
A method of manufacturing integrated circuits is performed by coating a substrate with resist, exposing the resist to light through a pattern in a mask so as to define slots in the resist corresponding to the pattern in the mask, chemically developing the resist after exposure to light, and choosing the thickness of the resist so as to achieve the desired profile of the slots defined in the resist.
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