Machine vision method for the inspection of a material for defects

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United States of America Patent

PATENT NO 6531707
SERIAL NO

09842842

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Abstract

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A machine vision method and system for inspecting a material. The system comprises a light source arranged to illuminate the material and an imaging device configured to acquire image data corresponding to at least one characteristic of the material while the material is being illuminated by the light source. An image processor is configured to normalize the image data and to control adjustment of an exposure control level for the imaging device based upon the normalized image data. An exemplary method of implementing the machine vision system may include illuminating a material using a light source and obtaining image data corresponding to the material using an imaging device. The image data may be normalized and the adjustment of an exposure control level of the imaging device may be controlled based on the normalized image data.

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Patent Owner(s)

Patent OwnerAddress
AMETEK INC1100 CASSATT ROAD BERWYN PA 19312

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Favreau, Patrice San Leandro, CA 6 459
Jaaskelainen, Markku E Sudbury, MA 2 38
Wolinsky, Jeffrey Berkeley, CA 4 76

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