Method and apparatus for integration of real-time tool data and in-line metrology for fault detection in an advanced process control (APC) framework
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United States of America Patent
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Mar 11, 2003
Grant Date -
N/A
app pub date -
Oct 29, 1999
filing date -
Oct 29, 1999
priority date (Note) -
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Abstract
A method and apparatus for providing near real-time fault detection in a manufacturing process is provided. The apparatus includes a processing tool adapted to manufacture a processing piece and an interface, coupled to the processing tool, for receiving operational data from the processing tool related to the manufacture of the processing piece, and product data defining characteristics of the processing piece. In one embodiment, the processing tool is in the form of semiconductor fabrication equipment and the processing piece is a silicon wafer. A fault detection unit is provided to determine if a fault condition exists with the processing tool from the operational data or with the processing piece from the product data. An Advanced Process Control (APC) framework is further provided to receive the operational and product data from the first interface, and to send the data to the fault detection unit.
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