Plasma processing apparatus
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United States of America Patent
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Mar 18, 2003
Issued Date -
N/A
app pub date -
Jun 20, 2001
filing date -
Sep 27, 1996
priority date (Note) -
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Abstract
A plasma processing apparatus includes a processing chamber having a working volume. A single Radio-Frequency (RF) plasma generating antenna is positioned outside the working volume for inducing an electric field in the working volume. A dielectric trough extends into a wall of the chamber. The antenna is non-planar and transfers power through at least one wall and the base of the trough.
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