Method of forming film and apparatus thereof
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United States of America Patent
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-
Mar 25, 2003
Grant Date -
N/A
app pub date -
Nov 15, 2000
filing date -
Nov 18, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of forming a film of a coating solution on a substrate includes steps of moving a coating solution discharge member relative to a substrate while a coating solution is being discharged from the coating solution discharge member to the surface of the substrate, and changing a discharge direction of the coating solution to an outer peripheral portion of the substrate to make the amount of application to the outer peripheral portion smaller than that to other portions. This can reduce the amount of application to the outer peripheral portion of the substrate, thereby making it possible to restrain protuberance of the coating solution at the outer peripheral portion of the substrate caused by surface tension. Consequently, a coating film which is uniform also at the outer peripheral portion on the substrate is formed.
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