
US Patent No: 6,537,738
Number of patents in Portfolio can not be more than 2000
System and method for making smooth diagonal components with a digital photolithography system
Stats
-
Mar 25, 2003
Issued date -
Aug 8, 2000
filing date -
09/633,978
serial no -
In Force
status
Importance
Abstract
A digital photolithography system is provided that is capable of making smooth diagonal components. The system includes a computer for providing a first digital pattern to a digital pixel panel, such as a deformable mirror device (DMD). The DMD is capable of providing a first plurality of pixel elements for exposure onto a plurality of wafer sites. After exposure, the wafer can be scanned a distance less than the site length. The DMD then receives a second digital pattern for exposing a second plurality of pixel elements onto the plurality of sites of the subject. The exposed second plurality of pixel elements overlaps the exposed first plurality of pixel elements. This overlapping allows incremental changes to be made in the image being exposed, thereby accommodating the creation of diagonal components.
First Claim
Related Publications
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
|
|
|||
| 5,949,557 Total internal reflection holography method and apparatus for lithography on 3-D spherical shaped integrated circuit | 16 | 1998 | |
| 6,052,517 Spherical cell design for VLSI circuit design on a spherical semiconductor | 19 | 1998 | |
| 6,071,315 Two-dimensional to three-dimensional VLSI design | 15 | 1998 | |
| 6,048,011 Apparatus for contactless capturing and handling of spherical-shaped objects | 11 | 1998 | |
| 6,061,118 Reflection system for imaging on a nonplanar substrate | 13 | 1999 | |
|
|
|||
| 5,049,901 Light modulator using large area light sources | 104 | 1990 | |
| 5,132,723 Method and apparatus for exposure control in light valves | 88 | 1991 | |
| 5,818,498 Method of multi-channel thermal recording | 21 | 1995 | |
|
|
|||
| 6,072,518 Method for rapid imaging of thermographic materials by extending exposure time in a single beam laser scanner | 13 | 1997 | |
| 6,107,011 Method of high resolution optical scanning utilizing primary and secondary masks | 22 | 1999 | |
|
|
|||
| 5,995,129 Image-wise exposure apparatus | 11 | 1997 | |
| 6,124,876 Image-wise exposure apparatus, mirror array device, and liquid crystal panel | 23 | 1999 | |
|
|
|||
| 4,744,047 Pattern test apparatus including a plurality of pattern generators | 37 | 1985 | |
| 4,879,466 Semiconductor radiation detector | 21 | 1988 | |
|
|
|||
| 5,461,455 Optical system for the projection of patterned light onto the surfaces of three dimensional objects | 28 | 1993 | |
| 5,909,658 High speed electron beam lithography pattern processing system | 22 | 1996 | |
|
|
|||
| 5,300,966 Projector | 35 | 1992 | |
| 5,416,729 Generalized solids modeling for three-dimensional topography simulation | 55 | 1994 | |
|
|
|||
| 5,079,544 Standard independent digitized video system | 334 | 1989 | |
| 5,905,545 Full-color projection display system using two light modulators | 75 | 1996 | |
|
|
|||
| 5,281,996 Photolithographic reduction imaging of extended field | 75 | 1992 | |
| 5,691,541 Maskless, reticle-free, lithography | 135 | 1996 | |
|
|
|||
| 5,955,776 Spherical shaped semiconductor integrated circuit | 72 | 1997 | |
|
|
|||
| 6,204,875 Method and apparatus for light modulation and exposure at high exposure levels with high resolution | 26 | 1998 | |
|
|
|||
| 5,109,290 Image recording system for recording image plane comprising pixel area and non-pixel area | 23 | 1991 | |
|
|
|||
| 5,208,818 Laser system for recording data patterns on a planar substrate | 67 | 1991 | |
|
|
|||
| 6,251,550 Maskless photolithography system that digitally shifts mask data responsive to alignment data | 65 | 1999 | |
|
|
|||
| 6,084,656 Programmable mask for exposure apparatus | 32 | 1998 | |
|
|
|||
| 5,131,976 Josephson junction apparatus formed on flexible polymeric film and producing method thereof | 19 | 1990 | |
|
|
|||
| 5,082,755 Liquid crystal programmable photoresist exposure method for making a set of masks | 25 | 1990 | |
|
|
|||
| 5,121,983 Stereoscopic projector | 98 | 1990 | |
|
|
|||
| 5,995,475 Two dimensional laser diode array using multimode lasers | 24 | 1997 | |
|
|
|||
| 5,361,272 Semiconductor architecture and application thereof | 17 | 1992 | |
|
|
|||
| 6,205,364 Method and apparatus for registration control during processing of a workpiece particularly during producing images on substrates in preparing printed circuit boards | 18 | 1999 | |
|
|
|||
| 5,892,231 Virtual mask digital electron beam lithography | 21 | 1997 | |
|
|
|||
| 5,900,637 Maskless lithography using a multiplexed array of fresnel zone plates | 54 | 1997 | |
|
|
|||
| 5,998,069 Electrically programmable photolithography mask | 56 | 1997 | |
|
|
|||
| 5,793,473 Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same | 34 | 1997 | |
|
|
|||
| 5,870,176 Maskless lithography | 112 | 1997 | |
|
|
|||
| 5,269,882 Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography | 50 | 1991 | |
|
|
|||
| 5,106,455 Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography | 69 | 1991 | |
|
|
|||
| 5,431,127 Process for producing semiconductor spheres | 38 | 1994 | |
|
|
|||
| 6,014,203 Digital electron lithography with field emission array (FEA) | 17 | 1998 | |
|
|
|||
| 5,138,368 Fabrication of printed wiring boards by projection imaging | 25 | 1989 | |
|
|
|||
| 6,133,986 Microlens scanner for microlithography and wide-field confocal microscopy | 320 | 1997 | |
Patent Citation Ranking
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 25, 2014 |
| Fee | Large entity fee | small entity fee | micro entity fee |
|---|---|---|---|
| Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
| Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
| Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |