Characterization of microelectromechanical structures

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United States of America Patent

PATENT NO 6542829
SERIAL NO

09668013

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Abstract

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Accurate characterization of microelectromechanical systems (MEMS) geometry is critical for device design and simulation, for material property extraction, and for post-fabrication trimming. According to the present embodiment, a method for characterizing parameters describing MEMS structures resulting from the fabrication process or process variations is presented. According to the prefered embodiment, experimentally obtained natural frequencies are compared with numerical simulations to identify unknown values of structural parameters or parameter variations. Further, the prefered embodiment teaches how electrostatically-driven laterally resonant comb-drive MEMS test structures with prescribed changes in spring width are used to characterize systematic variations in process offsets and sidewall angles. The disclosed technique is both in-situ and non-destructive.

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Patent Owner(s)

Patent OwnerAddress
COVENTOR INC1000 CENTREGREEN WAY SUITE 200 CARY NC 27513

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gupta, Raj K San Francisco, CA 8 127

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