Method of automatic layout design for LSI, mask set and semiconductor integrated circuit manufactured by automatic layout design method, and recording medium storing automatic layout design program
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Apr 8, 2003
Grant Date -
N/A
app pub date -
Nov 15, 2000
filing date -
Nov 17, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
With an automatic layout method, a first line having a firs line width is generated in a prescribed direction. A second line having a second line width and extending at an oblique angle with respect to the first line is generated, so that the second line terminates at an end portion of the first line with an overlapped area. One or more VIA patterns are read out of a database according to the shape of the overlapped area. The VIA patterns are placed in the overlapped area, so that one of the VIA patterns is located at the intersection of the center lines of the first and second lines. The VIA pattern is a combination of parallelograms, including squares and rectangles.
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