Pad conditioning disk
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Apr 22, 2003
Grant Date -
N/A
app pub date -
Oct 5, 2000
filing date -
Oct 5, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An end effector is provided for conditioning a polishing pad. The end effector comprises a backing plate, a matrix material adhered to a first surface of the backing plate, and a plurality of crystals embedded in the matrix material an amount sufficient to prevent the plurality of crystals from becoming dislodged from the matrix material during pad conditioning. The plurality of crystals have an absolute crystal height distribution that is skewed toward zero. Methods are also provided for forming the above-described end effector.
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