Arrangement and method for improving vacuum in a very high vacuum system
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United States of America Patent
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Apr 29, 2003
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N/A
app pub date -
Aug 24, 1999
filing date -
Feb 26, 1997
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Abstract
The invention concerns an arrangement for improving vacuum in a very high vacuum system (ultrahigh vacuum) comprising a metal chamber releasing gas at its surface, consisting of a coating deposited on at least almost the whole surface of the metal wall defining the chamber. The invention is characterised in that the coating further comprises at least an undercoat of non-evaporating getter deposited on said surface of the metal wall defining the chamber and, on this undercoat, at least a thin film of at least a catalyst selected among ruthenium and/or rhodium and/or palladium and/or osmium and/or iridium and/or platinum and/or an alloy containing at least one of those.
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