Importance

Loading Importance Indicators...

Abstract

In a vacuum treatment apparatus for deposition of thin layers on shell-shaped substrates (2, 2', . . . ) with a plurality of treatment stations (8, 9) and airlock stations (10, 20) held by an otherwise closed stationary circular cylindrical vacuum chamber wall (7) and a with rotatably arranged inner wall cylinder (14) which holds the treatment stations (3 through 6) and which inner wall is enclosed by the vacuum chamber wall (7) and in which vacuum chamber wall openings (25, 26, 27, 28) are provided, which openings are capable of overlapping the substrate chambers (3 through 6) and through which openings the treatment agents can act upon the substrates (2, 2'), and with an outer wall (16, 16') enclosing the vacuum chamber wall, and in which apparatus there are provided two airlock stations (10, 20) which are located diametrically opposite each other and tangentially to the outer wall of the vacuum chamber (7), and to each of these two airlock stations (10, 20) there is assigned a substrate conveyor (19 or 22) which conveyor alternately transports a substrate to the airlock station (10, 20) or away from the airlock station (10, 20), where the loading or unloading of substrates (2, 2'), located at the time in the vicinity of the airlock station, occurs dependent on the rotational motion of the inner cylinder.

Loading the Abstract Image...

First Claim