Method and apparatus for separating wafers

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6558109
APP PUB NO 20010046435A1
SERIAL NO

09865738

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Wafers are separated individually from a stack by directing multiple jets of fluid between an outermost wafer in the stack and an adjacent wafer. The jets have sufficient pressure and are sufficiently spaced apart around the wafer stack to cause the outermost wafer to separate longitudinally from the adjacent wafer without lateral movement there between. In the illustrated embodiment, a chuck is attached to a planar surface of the outermost wafer. The attached wafer and wafer stack, once separated by the jet of fluid, are moved relatively apart, such as by movement of the chuck. The wafers in the stack are thereby separated without contact between a wafer edge and a solid object (such as a container wall or hand), minimizing the risk of wafer breakage.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
MEI WET PROCESSING SYSTEMS & SERVICES LLC3838 WESTERN WAY NE ALBANY OR 97321

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gibbel, David S Falls City, OR 8 211

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation