Method of manufacturing micromechanical surface structures by vapor-phase etching
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United States of America Patent
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May 6, 2003
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N/A
app pub date -
Feb 5, 1998
filing date -
Feb 6, 1997
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Abstract
A method of sacrificial layer etching of micromechanical surface structures, in which a sacrificial layer is deposited on a heatable silicon substrate and is structured. A temperature difference between the substrate and the vapor phase of an etching medium is established in such a way that exposed metal contacts made of aluminum alloys are not attacked at the same time and are not subsequently exposed to any risk of corrosion.
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