Fluid distribution system and process, and semiconductor fabrication facility utilizing same
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United States of America Patent
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May 13, 2003
Issued Date -
N/A
app pub date -
Jun 5, 2001
filing date -
Jul 24, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.
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