Chemical-mechanical contouring (CMC) method for forming a contoured surface using a stair-step etch
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United States of America Patent
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May 13, 2003
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N/A
app pub date -
Jul 26, 2000
filing date -
Jul 26, 2000
priority date (Note) -
Expired
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Abstract
A process of chemical-mechanical contouring (CMC) using a stair-step etch involves formation of an elevated layer of substrate overlying a device, in the illustrative example a thin-film magnetic head. The elevated layer of substrate is formed into a stair-step structure with the height and width of the stair-steps selected to attain a predetermined shape and size.
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