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Abstract

A method for producing a monolithic, seamless, polymeric housing structure for a micromachine uses a stereolithographic method to produce the structure layer by layer by exposing sequentially formed films of photopolymer to a beam of electromagnetic radiation scanned over patterns of locations corresponding to at least partially superimposed layers of the housing structure. The housing structure may include openings through which movable elements such as shafts and linkages may extend, and may provide sealed passage for electrical conductors therethrough from the micromachine to the exterior of the housing structure. Complex housing structures including closed or almost closed chambers and interior partition walls as well as interior passages of complex configuration may be formed to accommodate individual components or component assemblies. The micromachine may be assembled during fabrication of the housing structure, and preformed components or assemblies placed into the partially formed housing structure and the housing structure subsequently completed.

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First Claim