Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film
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United States of America Patent
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May 13, 2003
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N/A
app pub date -
Dec 23, 1999
filing date -
Apr 24, 1998
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Abstract
A coating liquid for forming a silica-based film having a low dielectric constant, as low as 3 or less, comprising (i) silica-based fine particles having phenyl groups and (ii) a polysiloxazane which can be produced by reacting hydrolyzate of an alkoxysilane represented by the formula (X.sub.n Si(OR.sup.1).sub.4-n)and/or hydrolyzate of a halogenated silane represented by the formula (X.sub.n SiX'.sub.4-n) with a polysilazane represented by --(SiR.sup.2 R.sup.4 --NR.sup.3)--.sub.m, or a coating-liquid for forming the silica-based film, comprising (i) silica-based fine particles having phenyl groups and (ii') an oxidatively decomposable resin with the weight ratio of the particles to the resin being in the range of 0.5 to 5.
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