Fluoropolymer-coated photomasks for photolithography
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United States of America Patent
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May 20, 2003
Grant Date -
Jan 30, 2003
app pub date -
Jul 26, 2001
filing date -
Jul 26, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
Photomasks for photolithographic processes are described that incorporate a protective amorphous poly(fluorocarbon) film on their surface, the film serving to reduce contamination at the photomask surface. The preparation of the coated photomasks is also described, as is their use in a photolithographic process.
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