Importance

Loading Importance Indicators...

Abstract

The invention relates to novel cyclic siloxane compounds of the following general formula (I): ##STR1## in which: n=0, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10 preferably 1, 2, 3, 4, 5; A=H or C.sub.1 -C.sub.15 alk(en)yl, C.sub.3 -C.sub.15 cycloalk(en)yl, C.sub.6 -C.sub.12 aryl, C.sub.8 -C.sub.18 alkaryl, where, in the said radicals, in each case one or more C atoms can be replaced by O, C.dbd.O, O(C.dbd.O), SiR.sub.2 and/or NR, R being an aliphatic radical with 1 to 7 C atoms, in which one or more C atoms can be replaced by O, C.dbd.O, and/or O(C.dbd.O); B=E or a linear, branched or polycyclic aliphatic- or aromatic-groups-containing hydrocarbon radical which links 2 to 10 of the cyclosiloxane radicals defined above, less B, to one another and contains 2 to 50 C atoms and additionally 0 to 30 other atoms from the group O, N, S, P, Si, Cl, F, Br, I and from which correspondingly 1 to 9, preferably 1 to 4 of the above defined cyclosiloxane radicals, less B, are pending; E=A or a polymerizable group G--Q--L, where on average up to 50% or less of the groups E correspond to representatives of A; G=C.sub.1-10 alk(en)ylene; Q=O, N--A or a di- or polyvalent linear, branched or cyclic alcohol, amine or aminoalcohol radical with 2 to 10 C atoms; L=an organic radical, containing a C.dbd.C double bond, with 2 to 10 C atoms; and with the proviso that no annelated siloxane ring systems can occur in (I), and also dental compositions which contain the compounds of formula (I) and/or compounds of formula (II): ##STR2## in which: T=independently of each other H or C.sub.1 -C.sub.10 alk(en)yl, C.sub.3 -C.sub.10 cycloalk(en)yl, C.sub.6 -C.sub.12 aryl or C.sub.8 -C.sub.8 alkaryl; N=a polymerizable group R.sup.1 --R.sup.2 --R.sup.3 ; b=0 to 500, where the proportion b may be at most 50% of the repeat units (b+c); c=1 to 1000; R.sup.1 =C.sub.1 -C.sub.10 alk(en)ylene; R.sup.2 =O, N--T or a di- or polyvalent linear, branched or cyclic alcohol, amine or aminoalcohol radical with 2 to 10 C atoms; R.sup.3 =an organic radical, containing a C.dbd.C double bond, with 3 to 10 C atoms; V=SiMe.sub.2 T, SiEt.sub.2 T, SiMePhT, SiPh.sub.2 T.

Loading the Abstract Image...

First Claim