Continuously variable dummy pattern density generating systems, methods and computer program products for patterning integrated circuits
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United States of America Patent
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May 20, 2003
Grant Date -
Aug 22, 2002
app pub date -
Aug 10, 2001
filing date -
Feb 21, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Dummy patterns are generated for a region of an integrated circuit that is divided into buckets by obtaining a local pattern density for a respective bucket and adjusting a density of the dummy pattern for the respective bucket as a continuously variable function of the respective local pattern density and a target density for the region. By providing a continuously variable dummy pattern density, the desired density of the dummy pattern group may be adjusted precisely, to thereby reduce or eliminate loading effects. The density of the dummy pattern for the respective bucket may be calculated according to a formula in which the density of the dummy pattern is continuously variable. The dummy patterns may include features of fixed pitch and a size of the features of fixed pitch is increased or decreased as a continuously variable function of the respective local pattern density and the target density for the region.
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