Gas-measuring system
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United States of America Patent
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-
May 27, 2003
Grant Date -
Oct 4, 2001
app pub date -
Feb 28, 2001
filing date -
Mar 29, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An optical gas-measuring system and process identifies especially infrared-active individual gases over a measuring path of about 100 m and to determine their concentration averaged over the measuring path swept. The laser source (11) emits a divergent ray beam, from which both the measuring beam and the reference beam are formed after a single-time reflection of the emitted ray beam. A first radiation reflector (14) is designed in the form of a first hollow mirror for the reflection of a first part of the ray beam emitted from the laser source (11) as a measuring beam into the open optical measuring path. A second radiation reflector (16) is designed in the form of a second hollow mirror for the reflection of a second part of the ray beam emitted from the laser source (11) as a reference beam into a reference gas cuvette (17) containing the reference gas sample for the gas to be measured. A third radiation reflector (21) is designed in the form of a third hollow mirror for the reflection of the measuring beam received after passing through the optical measuring path onto a first radiation detector (22).
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