Method and apparatus for using latency time as a run-to-run control parameter
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United States of America Patent
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May 27, 2003
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app pub date -
Dec 27, 2000
filing date -
Dec 27, 2000
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Abstract
The present invention provides for a method and an apparatus for using a latency time period as a control input parameter. A manufacturing run of semiconductor devices is processed. Metrology data from the processed semiconductor devices is acquired. A latency analysis process is performed using the acquired metrology data. A feedback/feed-forward modification process is performed in response to the latency analysis process.
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