Method for structuring transparent electrode layers
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United States of America Patent
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Jun 10, 2003
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app pub date -
Jun 28, 2001
filing date -
Sep 17, 1998
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Abstract
The invention relates to a method for structuring transparent, conductive layers, especially for structuring transparent electrode layers in thin-layer components. The selected wavelength (.lambda.) of the laser used for structuring should fall substantially within the plasma absorption range of the transparent electrode layer and should fulfill following three requirements: a) the wavelength .lambda. of the laser must be greater than the cut-off wavelength .lambda..sub.g.sup.opt for optical absorption in the base absorber, b) the wavelength .lambda. of the laser must be greater than the cut-off wavelength for free substrate absorption (plasma absorption) .lambda..sub.g.sup.pla in the transparent electrode layer, and c) the wavelength .lambda. of the laser must be less than the cut-off wavelength for metallic reflection .lambda..sub.g.sup.met on the transparent front electrode.
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