Method of detecting and controlling in-situ faults in rapid thermal processing systems

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United States of America Patent

PATENT NO 6577926
SERIAL NO

09280508

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Abstract

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Faults occurring in the operation of a rapid thermal process system are detected and dynamically controlled in-situ. A data set is generated which represents the power applied to heating elements which are spatially arranged in a plurality of zones. The data is converted to a sequence of fractions respectively representing the power applied to each zone relative to the total applied power. The fractions are sequentially arranged and a least squares straight line fit for the fractions is calculated. The slope of the calculated straight line fit is used in a statistical process control system to determine whether a fault has occurred, and to make appropriate corrections in process control parameters, such as the length of time the process is carried out.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Shih Hui Taipei, TW 1 4
Cheng, Kuo-Hsien Hsin Chu, TW 16 141
Chiu, Wen Zen Feng Yuan, TW 1 4
Lin, Cheng Kun Taipei-Hsien, TW 5 128

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