Importance

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Abstract

The present invention is a treatment solution supply apparatus for supplying a treatment solution onto a substrate and includes: a discharge nozzle for discharging the treatment solution onto the substrate; a container for storing the treatment solution; a supply piping for connecting the discharge nozzle and the container; a pump provided along the supply piping; a pump drive mechanism for controlling operation of the pump; a circulation piping having one end branching out from the piping between the container and the pump and another end provided at the pump; a filter, provided at some midpoint along the supply piping and between the one end and the other end of the circulation piping, for filtering the treatment solution to remove a foreign substance; a drain piping for draining the treatment solution filtered by the filter and containing the foreign substance; and a valve provided along the drain piping for controlling a flow rate of the treatment solution drained from the filter. According to the present invention, the treatment solution is supplied with part thereof being circulated through the circulation piping, so that the part of the treatment solution passes through the filter again to be discharged from the discharge nozzle. Consequently, foreign substances existing in the treatment solution can be efficiently removed.

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First Claim