Dust cover for use in semiconductor fabrication
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United States of America Patent
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-
Jun 24, 2003
Grant Date -
Aug 2, 2001
app pub date -
Jan 30, 2001
filing date -
Aug 11, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A dust cover having a film with an inorganic, anti-reflective coating and method for use during semiconductor fabrication. The dust cover is primarily for use during photolithography. The dust cover may include an amorphous fluoropolymer film having an inorganic, anti-reflective coating attached to a frame. The inorganic, anti-reflective coating preferably has a refractive index below 1.4.
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